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EnglishTwo-beam interferometry is a tool of high-precision length-metrology, where displacements are measured to within sub-nanometer resolution and accuracy. Differential wavefront sensing - via phase detection by segmented photodiodes - adds the capability of simultaneously measuring the target translation and rotation. This paper gives an analytical model explaining the observation of fake tilts by a combined x-ray and optical interferometer.
Fake tilts in differential wavefront sensing / Massa, Enrico; Sasso, Carlo Paolo; Mana, Giovanni. - In: OPTICS EXPRESS. - ISSN 1094-4087. - 27:24(2019), p. 34505-34518. [10.1364/OE.27.034505]
| Titolo: | Fake tilts in differential wavefront sensing | |
| Autori: | ||
| Data di pubblicazione: | 2019 | |
| Rivista: | OPTICS EXPRESS | |
| Digital Object Identifier (DOI): | http://dx.doi.org/10.1364/OE.27.034505 | |
| Abstract: | Two-beam interferometry is a tool of high-precision length-metrology, where displacements are mea...sured to within sub-nanometer resolution and accuracy. Differential wavefront sensing - via phase detection by segmented photodiodes - adds the capability of simultaneously measuring the target translation and rotation. This paper gives an analytical model explaining the observation of fake tilts by a combined x-ray and optical interferometer. | |
| Full-text (pubblici): | open | |
| Appare nelle tipologie: | 1.1 Articolo in rivista |
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