A stress exists in solid surfaces even if the underlying bulk material is stress-free. This paper investigates the effect of surface stress on the value of the Si lattice parameter measured by combined x-ray and optical interferometry. An elastic-film model has been used to provide a surface load in a finite element model on the x-ray interferometer crystal. Eventually, an interferometer design is proposed to determine a measurement where the effect of the surface stress is deemed to be detected.
A finite element analysis of surface-stress effects on measurement of the Si lattice parameter / Quagliotti, D; Mana, Giovanni; Massa, Enrico; Sasso, CARLO PAOLO; Kuetgens, U.. - In: METROLOGIA. - ISSN 0026-1394. - 50:3(2013), pp. 243-248. [10.1088/0026-1394/50/3/243]
A finite element analysis of surface-stress effects on measurement of the Si lattice parameter
MANA, GIOVANNI;MASSA, ENRICO;SASSO, CARLO PAOLO;
2013
Abstract
A stress exists in solid surfaces even if the underlying bulk material is stress-free. This paper investigates the effect of surface stress on the value of the Si lattice parameter measured by combined x-ray and optical interferometry. An elastic-film model has been used to provide a surface load in a finite element model on the x-ray interferometer crystal. Eventually, an interferometer design is proposed to determine a measurement where the effect of the surface stress is deemed to be detected.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
