We describe a test carried out by using a two-thickness interferometer to investigate the effect of the surface stress on the measurement of the silicon lattice constant.
A two thickness interferometer for lattice strain investigations / Massa, E., Melis, C., Sasso, C.P., Kuetgens, U., Mana, G.. - (2016), pp. 1-2. (2016 Conference on Precision Electromagnetic Measurements (CPEM 2016) ) [10.1109/CPEM.2016.7540796].
A two thickness interferometer for lattice strain investigations
Massa, Enrico
;Sasso, Carlo Paolo;Mana, Giovanni
2016
Abstract
We describe a test carried out by using a two-thickness interferometer to investigate the effect of the surface stress on the measurement of the silicon lattice constant.File in questo prodotto:
| File | Dimensione | Formato | |
|---|---|---|---|
|
07540796.pdf
non disponibili
Tipologia:
final published article (publisher’s version)
Licenza:
Non Pubblico - Accesso privato/ristretto
Dimensione
290.38 kB
Formato
Adobe PDF
|
290.38 kB | Adobe PDF | Visualizza/Apri Richiedi una copia |
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
