A survey of the nanometrology-related activities in progress at the Istituto di Metrologia “G. Colonnetti” (IMGC) is presented. Some special apparatus for critical measurements in the nanoscale range are described. The development of instrumentation and methods for quantitative scanning probe microscopy, optical diffractometry, and atomic scale displacement metrology by combined x-ray and optical interferometry is outlined. Focus is given on calibration and methods for traceable measurements, high-resolution positioning, and subnanometer displacements measurements.
Nanometrology at the IMGC / Bisi, Marco; Massa, Enrico; Pasquini, A.; Picotto, Gianbartolo; Pisani, Marco. - (2005), pp. 22-37. [10.1002/3527606661.ch2]
Nanometrology at the IMGC
BISI, MARCO;MASSA, ENRICO;PICOTTO, GIANBARTOLO;PISANI, MARCO
2005
Abstract
A survey of the nanometrology-related activities in progress at the Istituto di Metrologia “G. Colonnetti” (IMGC) is presented. Some special apparatus for critical measurements in the nanoscale range are described. The development of instrumentation and methods for quantitative scanning probe microscopy, optical diffractometry, and atomic scale displacement metrology by combined x-ray and optical interferometry is outlined. Focus is given on calibration and methods for traceable measurements, high-resolution positioning, and subnanometer displacements measurements.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
