Josephson junctions with non-hysteretic current-voltage characteristics form the basis of most superconducting electronic circuits including RSFQ logic and programmable Josephson voltage standards. In contrast to conventional SIS devices, Nb/Al AlOx - Nb (SNIS) junctions with an additional comparatively thick Al interlayer and a comparatively thin barrier AlOx are intrinsically shunted at T >= 4.2 K. In this contribution, we provide experimental and theoretical arguments proving that this finding is mainly explained by a broad distribution of highly-conductive barrier transparencies with a significant effect from nearly ballistic modes. An additional advantage of the proposed SNIS junctions is possibility to tune the critical voltage value by modifying Nb and/or Al film thicknesses. With observations of wide Shapiro steps up to 1.25 V at 6.3 K we show that this type of Josephson junctions can be successfully used at temperatures above 4.2 K. The presence of well-developed quantized voltage features even at 7.2 K means that Nb/Al - AlOx- Nb devices can successfully operate far above the liquid helium temperature and, in principle, are compatible with two-stage cryocoolers.

Improved Characteristics of Intrinsically Shunted Nb/Al - AlO(x) - Nb Josephson Junctions / Lacquaniti, Vincenzo; DE LEO, Maria; Fretto, MATTEO ANDREA; Sosso, Andrea; Andreone, D; Belogolovskii, M.. - In: IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY. - ISSN 1051-8223. - 21:3(2011), pp. 111-114. [10.1109/TASC.2010.2080656]

Improved Characteristics of Intrinsically Shunted Nb/Al - AlO(x) - Nb Josephson Junctions

LACQUANITI, VINCENZO;DE LEO, MARIA;FRETTO, MATTEO ANDREA;SOSSO, ANDREA;
2011

Abstract

Josephson junctions with non-hysteretic current-voltage characteristics form the basis of most superconducting electronic circuits including RSFQ logic and programmable Josephson voltage standards. In contrast to conventional SIS devices, Nb/Al AlOx - Nb (SNIS) junctions with an additional comparatively thick Al interlayer and a comparatively thin barrier AlOx are intrinsically shunted at T >= 4.2 K. In this contribution, we provide experimental and theoretical arguments proving that this finding is mainly explained by a broad distribution of highly-conductive barrier transparencies with a significant effect from nearly ballistic modes. An additional advantage of the proposed SNIS junctions is possibility to tune the critical voltage value by modifying Nb and/or Al film thicknesses. With observations of wide Shapiro steps up to 1.25 V at 6.3 K we show that this type of Josephson junctions can be successfully used at temperatures above 4.2 K. The presence of well-developed quantized voltage features even at 7.2 K means that Nb/Al - AlOx- Nb devices can successfully operate far above the liquid helium temperature and, in principle, are compatible with two-stage cryocoolers.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11696/31706
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