Submicron machining and biomolecule immobilization on porous silicon by electron beam

Imbraguglio, D; Giovannozzi, Andrea Mario; Nastro, A; Rossi, Andrea Mario

doi:10.1186/1556-276X-7-530

Three-dimensional submicrometric structures and biomolecular patterns have been fabricated on a porous silicon film by an electron beam-based functionalization method. The immobilized proteins act as a passivation layer against material corrosion in aqueous solutions. The effects' dependence on the main parameters of the process (i.e., the electron beam dose, the biomolecule concentration, and the incubation time) has been demonstrated.

Submicron machining and biomolecule immobilization on porous silicon by electron beam / Imbraguglio D; Giovannozzi A M; Nastro A; Rossi A. - In: NANOSCALE RESEARCH LETTERS. - ISSN 1931-7573. - 7:530(2012). [10.1186/1556-276X-7-530]

Titolo:	Submicron machining and biomolecule immobilization on porous silicon by electron beam
Autori:	IMBRAGUGLIO, DARIO GIOVANNOZZI, ANDREA MARIO Nastro A ROSSI, ANDREA MARIO mostra contributor esterni nascondi contributor esterni
Data di pubblicazione:	2012
Rivista:	NANOSCALE RESEARCH LETTERS
Citazione:	Submicron machining and biomolecule immobilization on porous silicon by electron beam / Imbraguglio D; Giovannozzi A M; Nastro A; Rossi A. - In: NANOSCALE RESEARCH LETTERS. - ISSN 1931-7573. - 7:530(2012). [10.1186/1556-276X-7-530]
Abstract:	Three-dimensional submicrometric structures and biomolecular patterns have been fabricated on a porous silicon film by an electron beam-based functionalization method. The immobilized proteins act as a passivation layer against material corrosion in aqueous solutions. The effects' dependence on the main parameters of the process (i.e., the electron beam dose, the biomolecule concentration, and the incubation time) has been demonstrated.
Handle:	http://hdl.handle.net/11696/30109
Appare nelle tipologie:	1.1 Articolo in rivista

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