Three-dimensional submicrometric structures and biomolecular patterns have been fabricated on a porous silicon film by an electron beam-based functionalization method. The immobilized proteins act as a passivation layer against material corrosion in aqueous solutions. The effects' dependence on the main parameters of the process (i.e., the electron beam dose, the biomolecule concentration, and the incubation time) has been demonstrated.
Submicron machining and biomolecule immobilization on porous silicon by electron beam / Imbraguglio, D; Giovannozzi, ANDREA MARIO; Nastro, A; Rossi, ANDREA MARIO. - In: NANOSCALE RESEARCH LETTERS. - ISSN 1931-7573. - 7:530(2012). [10.1186/1556-276X-7-530]
Submicron machining and biomolecule immobilization on porous silicon by electron beam
Imbraguglio D;GIOVANNOZZI, ANDREA MARIO;ROSSI, ANDREA MARIO
2012
Abstract
Three-dimensional submicrometric structures and biomolecular patterns have been fabricated on a porous silicon film by an electron beam-based functionalization method. The immobilized proteins act as a passivation layer against material corrosion in aqueous solutions. The effects' dependence on the main parameters of the process (i.e., the electron beam dose, the biomolecule concentration, and the incubation time) has been demonstrated.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.