An increasing interest in tunable photonic structures is growing within the photonic community. The usage of Liquid Crystalline Elastomer (LCE) structures in the micro-scale has been motivated by the potential to remotely control their properties. In order to design elastic photonic structures with a three-dimensional lithographic technique, an analysis of the different mixtures used in the micro-printing process is required. Previously reported LCE microstructures suffer damage and strong swelling as a limiting factor of resolution. In this article, we reported a detailed study on the writing process with four liquid crystalline photoresists, in which the percentage of crosslinker is gradually increased. The experiments reveal that exploiting the crosslinking degree is a possible means in which to obtain suspended lines with good resolution, quite good rigidity, and good elasticity, thereby preserving the possibility of deformation by light irradiation.
Photoresist design for elastomeric light tunable photonic devices / Nocentini, S.; Martella, D.; Parmeggiani, C.; Wiersma, D. S.. - In: MATERIALS. - ISSN 1996-1944. - 9:7(2016), p. 525.
|Titolo:||Photoresist design for elastomeric light tunable photonic devices|
Parmeggiani, Camilla (Corresponding)
|Data di pubblicazione:||2016|
|Citazione:||Photoresist design for elastomeric light tunable photonic devices / Nocentini, S.; Martella, D.; Parmeggiani, C.; Wiersma, D. S.. - In: MATERIALS. - ISSN 1996-1944. - 9:7(2016), p. 525.|
|Appare nelle tipologie:||1.1 Articolo in rivista|