Thanks to its excellent mechanical properties, graphene is particularly suited for the realization of suspended membranes. The present paper deals with one possible application of such membranes that is the realization of suspended lithographic masks for shadow evaporation onto a substrate. This technique, which is largely used for realizing mesoscopic devices, where the quality requirements for the junctions prevent the exposure to ambient air and the occurrence of quantum phenomena requires highly defined structures, can be improved by the use of pure 2-dimensional masks, like graphene ones. Advantages and differences of this material with respect to commonly employed polymers are presented and discussed.

Graphene Membrane as Suspended Mask for Lithography / Amato, Giampiero; Greco, Angelo; Vittone, Ettore. - In: JOURNAL OF NANOMATERIALS. - ISSN 1687-4110. - 2018:(2018), pp. 1-8. [10.1155/2018/2396593]

Graphene Membrane as Suspended Mask for Lithography

Amato, Giampiero
;
Greco, Angelo;Vittone, Ettore
2018

Abstract

Thanks to its excellent mechanical properties, graphene is particularly suited for the realization of suspended membranes. The present paper deals with one possible application of such membranes that is the realization of suspended lithographic masks for shadow evaporation onto a substrate. This technique, which is largely used for realizing mesoscopic devices, where the quality requirements for the junctions prevent the exposure to ambient air and the occurrence of quantum phenomena requires highly defined structures, can be improved by the use of pure 2-dimensional masks, like graphene ones. Advantages and differences of this material with respect to commonly employed polymers are presented and discussed.
File in questo prodotto:
File Dimensione Formato  
2396593 (2).pdf

accesso aperto

Tipologia: final published article (publisher’s version)
Licenza: Creative Commons
Dimensione 18.16 MB
Formato Adobe PDF
18.16 MB Adobe PDF Visualizza/Apri

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11696/65884
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 2
  • ???jsp.display-item.citation.isi??? 2
social impact