Superconducting MgB2 nanostructures fabricated by electron beam lithography

MgB2 meander lines with width ranging from 250 to 500 nm have been fabricated by electron beam lithography (EBL)-based technique. Magnesium diboride films grown by all-in-situ method have been used. A critical current density of 8 MA cm2 was measured for meander with width down to 300 nm. For sake of comparison the measurements have been performed as well on 10 μm wide strip patterned on the same sample. The results show that the nanostructuring process doesn’t affect the superconducting properties of the structure. The flexibility of the EBL approach makes it interesting in view of fabrication of MgB2 superconducting devices, such as photon detectors.