This chapter is a visual guide to the numerous approaches to nanolithography nanofabrication on large area based on supramolecular self-assembly. A short history of this recent scientific and technological field, an outline of the most-cited methods of self-assembly, and tables reporting different nanofabrication methods are reported. Indications on requirements, advantages, and drawbacks of the various approaches are also listed in the table. Thanks to the recently developed metal-assisted catalytic etching (MACE), the colloidal patterns can be easily propagated to silicon and other semiconductors opening a wide field of morphology, nanostructures, and applications.

Colloidal Lithography / Boarino, Luca; Laus, Michele. - 2-2(2018), pp. 805-814. [10.1007/978-3-319-71381-6_55]

Colloidal Lithography

Boarino, Luca
Writing – Original Draft Preparation
;
2018

Abstract

This chapter is a visual guide to the numerous approaches to nanolithography nanofabrication on large area based on supramolecular self-assembly. A short history of this recent scientific and technological field, an outline of the most-cited methods of self-assembly, and tables reporting different nanofabrication methods are reported. Indications on requirements, advantages, and drawbacks of the various approaches are also listed in the table. Thanks to the recently developed metal-assisted catalytic etching (MACE), the colloidal patterns can be easily propagated to silicon and other semiconductors opening a wide field of morphology, nanostructures, and applications.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11696/59891
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