This chapter is a visual guide to the numerous approaches to nanolithography nanofabrication on large area based on supramolecular self-assembly. A short history of this recent scientific and technological field, an outline of the most-cited methods of self-assembly, and tables reporting different nanofabrication methods are reported. Indications on requirements, advantages, and drawbacks of the various approaches are also listed in the table. Thanks to the recently developed metal-assisted catalytic etching (MACE), the colloidal patterns can be easily propagated to silicon and other semiconductors opening a wide field of morphology, nanostructures, and applications.
Colloidal Lithography / Boarino, Luca; Laus, Michele. - 2-2(2018), pp. 805-814.
BOARINO, LUCA [Writing – Original Draft Preparation] (Corresponding)
|Data di pubblicazione:||2018|
|Citazione:||Colloidal Lithography / Boarino, Luca; Laus, Michele. - 2-2(2018), pp. 805-814.|
|Appare nelle tipologie:||3.1 Monografia o trattato scientifico|