METRICA, l’archivio istituzionale della produzione scientifica dell’Istituto Nazionale di Ricerca Metrologica, ha lo scopo di raccogliere, documentare, conservare e pubblicare, anche ad accesso aperto, i prodotti della ricerca dell’Ente.
METRICA utilizza la piattaforma IRIS (Institutional Research Information System) sviluppata da Cineca.
EnglishThis chapter is a visual guide to the numerous approaches to nanolithography nanofabrication on large area based on supramolecular self-assembly. A short history of this recent scientific and technological field, an outline of the most-cited methods of self-assembly, and tables reporting different nanofabrication methods are reported. Indications on requirements, advantages, and drawbacks of the various approaches are also listed in the table. Thanks to the recently developed metal-assisted catalytic etching (MACE), the colloidal patterns can be easily propagated to silicon and other semiconductors opening a wide field of morphology, nanostructures, and applications.
Colloidal Lithography / Boarino, Luca; Laus, Michele. - 2-2(2018), pp. 805-814.
| Titolo: | Colloidal Lithography |
| Autori: | |
| Data di pubblicazione: | 2018 |
| Citazione: | Colloidal Lithography / Boarino, Luca; Laus, Michele. - 2-2(2018), pp. 805-814. |
| Handle: | http://hdl.handle.net/11696/59891 |
| ISBN: | 978-3-319-71379-3 978-3-319-71381-6 |
| Appare nelle tipologie: | 3.1 Monografia o trattato scientifico |
File in questo prodotto:
Copyright © 2021