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EnglishThis chapter is a visual guide to the numerous approaches to nanolithography nanofabrication on large area based on supramolecular self-assembly. A short history of this recent scientific and technological field, an outline of the most-cited methods of self-assembly, and tables reporting different nanofabrication methods are reported. Indications on requirements, advantages, and drawbacks of the various approaches are also listed in the table. Thanks to the recently developed metal-assisted catalytic etching (MACE), the colloidal patterns can be easily propagated to silicon and other semiconductors opening a wide field of morphology, nanostructures, and applications.
Colloidal Lithography / Boarino, Luca; Laus, Michele. - 2-2(2018), pp. 805-814. [10.1007/978-3-319-71381-6_55]
| Titolo: | Colloidal Lithography | |
| Autori: | ||
| Data di pubblicazione: | 2018 | |
| Digital Object Identifier (DOI): | 10.1007/978-3-319-71381-6_55 | |
| Abstract: | This chapter is a visual guide to the numerous approaches to nanolithography nanofabrication on l...arge area based on supramolecular self-assembly. A short history of this recent scientific and technological field, an outline of the most-cited methods of self-assembly, and tables reporting different nanofabrication methods are reported. Indications on requirements, advantages, and drawbacks of the various approaches are also listed in the table. Thanks to the recently developed metal-assisted catalytic etching (MACE), the colloidal patterns can be easily propagated to silicon and other semiconductors opening a wide field of morphology, nanostructures, and applications. | |
| Full-text (pubblici): | none | |
| Appare nelle tipologie: | 3.1 Monografia o trattato scientifico |
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